From d77485d95c14b94963f98bdfbeee6a564f3b49e6 Mon Sep 17 00:00:00 2001 From: Xiayun Zhao Date: Wed, 13 Sep 2017 15:30:41 -0500 Subject: [PATCH] Update paper.md cite "paper.bib" --- Paper/paper.md | 13 ++----------- 1 file changed, 2 insertions(+), 11 deletions(-) diff --git a/Paper/paper.md b/Paper/paper.md index a064242..ebd2671 100644 --- a/Paper/paper.md +++ b/Paper/paper.md @@ -21,22 +21,13 @@ bibliography: paper.bib # Summary -- This is a comprehensive MATLAB-based software platform developed for real-time measurement and feedback control of a custom mask-projection photopolymerization based additive manufacturing system (referred as "ECPL", i.e., Exposure Controlled Projection Lithography) using a lab-built interferometry (referred as "ICM&M", i.e., Interferometric Curing Monitoring and Measurement). A graphical user interface using the graphical user interface development environment (GUIDE) of MATLAB was created to implement the ICM&M method for the ECPL process. The software interfaces with the hardware of the ECPL system’s ultraviolet lamp and DMD, and the ICM&M system’s camera. It was designed to streamline the operation of the ECPL process with the aid of parallel computing that implements online both the ICM&M acquisition and measurement analysis as well as the feedback control method. The application logs the acquired interferogram video data, performs numerical computations for the ICM&M measurement algorithms and control law, saves the real-time data and measurement results for all voxels in the region of interest. Meanwhile, it displays interferogram frames and visualize the photocuring process without a substantial sacrifice in temporal performance of other key functions such as data acquisition and measurement & control analysis. +- This is a comprehensive MATLAB-based software platform developed for real-time measurement and feedback control [@FeedbackCtrl] of a custom mask-projection photopolymerization based additive manufacturing system (referred as "ECPL", i.e., Exposure Controlled Projection Lithography [@DissertationXYZ]) using a lab-built interferometry (referred as "ICM&M", i.e., Interferometric Curing Monitoring and Measurement [@SensorModel, @SensorAlgorithms, @SensorValidate]). A graphical user interface using the graphical user interface development environment (GUIDE) of MATLAB was created to implement the ICM&M method for the ECPL process. The software interfaces with the hardware of the ECPL system’s ultraviolet lamp and DMD, and the ICM&M system’s camera. It was designed to streamline the operation of the ECPL process with the aid of parallel computing that implements online both the ICM&M acquisition and measurement analysis as well as the feedback control method. The application logs the acquired interferogram video data, performs numerical computations for the ICM&M measurement algorithms [@SensorAlgorithms] and control law [@FeedbackCtrl], saves the real-time data and measurement results for all voxels in the region of interest. Meanwhile, it displays interferogram frames and visualize the photocuring process without a substantial sacrifice in temporal performance of other key functions such as data acquisition and measurement & control analysis. - The software could be extended to real-time process measurement and control for other additive manufacturing systems, for example, stereo-lithography (SLA) and metal based additive manufacturing aided by in-situ thermal images analysis. -- Related reference publications about the ECPL additive manufacturing system design, the ICM&M principle and validation, the real-time experiment results are listed below (in the references section). The software presented here is the backbone of the physical implementation of the ECPL process measurement and feedback control. +- Related reference publications about the ECPL additive manufacturing system design, the ICM&M principle and validation, the real-time experiment results are listed below (in the “paper.bib”). The software presented here is the backbone of the physical implementation of the ECPL process measurement and feedback control. - Demo videos of how to use the software, examples and corresponding metadata are provided in this repository’s folder of “Examples-Metadata”. - The document “paper.pdf” contains: (1) the research application that is associated with the software; (2) details about the software design, functions, and flowchart; (3) implementation examples. - -# References - -1. X. Zhao and D. Rosen, “Real-time Interferometric Monitoring and Measuring of photopolymerization based stereolithographic additive manufacturing process: sensor model and algorithm”, Measurement Science and Technology, Vol 28, Issue 1, 2016. doi:10.1088/0957-0233/28/1/015001. (http://dx.doi.org/10.1088/0957-0233/28/1/015001). -2. X. Zhao and D. Rosen, “A data mining approach of real-time process measurement for polymer additive manufacturing with the exposure controlled projection lithography”, Journal of Manufacturing Systems, Special Issue: Cybermanufacturing. doi:10.1016/j.jmsy.2017.01.005. (http://dx.doi.org/10.1016/j.jmsy.2017.01.005). -3. X. Zhao and D. Rosen, “Experimental validation and characterization of a real-time metrology system for photopolymerization based stereolithographic additive manufacturing process”, International Journal of Advanced Manufacturing Technology, Dec 2016. doi:10.1007/s00170-016-9844-1. (http://dx.doi.org/10.1007/s00170-016-9844-1) -4. X. Zhao and D. Rosen, “Parallel computing enabled real-time interferometric measurement and feedback control for a photopolymer based lithographic additive manufacturing process”, Mechatronics, Special Issue: Mechatronics and Additive Manufacturing. (July 2017: in review) -5. X. Zhao, “Process Measurement and Control for Exposure Controlled Projection Lithography”. Ph.D. Dissertation, Mechanical Engineering, Georgia Institute of Technology, Atlanta, USA, 2017. Available on https://smartech.gatech.edu/handle/1853/58294 -6. X. Zhao and D. Rosen, “Simulation Study on Evolutionary Cycle to Cycle Time Control of Exposure Controlled Projection Lithography”, Rapid Prototyping Journal, Vol 22, Issue 3, 2016, pp 456-464. doi: 10.1108/RPJ-01-2015-0008. doi:10.1108/RPJ-01-2015-0008. (http://dx.doi.org/10.1108/RPJ-01-2015-0008)